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2023

1. Deokjoon Eom, Jehoon Lee, Woohui Lee, Joohee Oh, Changyu Park, Jinyong Kim, Hyangsook Lee, Eunha Lee, Hyoungsub Kim

    "Combined effects of the deposition temperature and metal electrodes on ferroelectric properties of atomic-layer-deposited Hf0.5Zr0.5O2 

     films"

    Journal of Physics D: Applied Physics, 56, 6, 65301 (2023)

2. Woohui Lee, Jehoon Lee, Deokjoon Eom, Joohee Oh, Changyu Park, Jinyong Kim, Hyungchul Shin, Hyoungsub Kim

    "Electrical properties of HfO2 on Si1–xGex substrates pretreated using a Y precursor with and without subsequent oxidant pulsing"

    ACS Applied Electronic Materials, 5, 2, 1189-1195 (2023)

3. Jinyong Kim, Seongheum Choi, An Hoang-Thuy Nguyen, Woohui Lee, Rino Choi, Hyoungsub Kim

    "Effects of high-pressure H2 and D2 post-metallization annealing on the electrical properties of HfO2/Si0.7Ge0.3"

    Physica Status Solidi (RRL) – Rapid Research Letters, 17, 4, 2200439 (2023)

4. Eun Hye Kim, Do Hee Lee, Tae Jun Gu, Hyobin Yoo, Yamujin Jang, Jaemo Jeong, Hyun-Woo Kim, Seog-Gyun Kang, Hoijoon Kim,

    Heesoo Lee, Kyu-Jin Jo, Beom Ju Kim, Jin Wook Kim, Seong Hyun Im, Chang Seok Oh, Changgu Lee, Ki Kang Kim, Cheol-Woong Yang,

    Hyoungsub Kim, Youngkuk Kim, Philip Kim, Dongmok Whang, and Joung Real Ahn

    "Wafer-Scale Epitaxial Growth of an Atomically Thin Single-Crystal Insulator as a Substrate of Two-Dimensional Material Field-Effect

     Transistors"

    Nano Letters, 23, 7, 3054-3061 (2023)

5. Mina Seol, Uiseok Hwang, Junyoung Kim, Deokjoon Eom, In‑Kyung Park, Hyoungsub Kim, Jonghwan Suhr, Jae‑Do Nam

    "Solution printable multifunctional polymer‑based composites for smart electromagnetic interference shielding with tunable frequency and

     on–off selectivities"

    Advanced Composites and Hybrid Materials, 6, 46 (2023)

6. Mirine Leem, Deokjoon Eom, Heesoo Lee, Kwangwuk Park, Kwangsik Jeong, Hyoungsub Kim

    "Direct growth and interface reactions of ferroelectric Hf0.5Zr0.5O2 films on MoS2"

    Applied Surface Science, 629, 157426 (2023)

7. Heesoo Lee, Hoijoon Kim, Kihyun Kim, Kwangsik Jeong, Mirine Leem, Seunghyun Park, Jieun Kang, Geunyoung Yeom, Hyoungsub Kim

    "Three-Dimensional Surface Treatment of MoS2 Using BCl3 Plasma-Derived Radicals"

    ACS Applied Materials & Interfaces, 15, 39, 46513-46519 (2023)

2022

1. Jimin Baek, Hyojin Kim, Jihoon Yoo, Juwon Shin, Kiyong Shin, Walid Amir, Gunwu Ju, Hyungjun Kim, Joohee Oh, Hyoungsub Kim, Taewoo

    Kim, Daehyun Kim

    "Vertical homo-junction In0.53Ga0.47As tunneling field-effect transistors with minimum subthreshold swing of 52 mV/decade"

    Applied Physics Letters, 120, 22, 222902 (2022)

2. Gwon Kim, Jaehyuk Lim, Deokjoon Eom, Yejoo Choi, Hyoungsub Kim, Changhwan Shin

    "Impact of various pulse-bases on charge boost in ferroelectric capacitors"

    IEEE Electron Device Letters, 43, 11, 1953 (2022)

3. Jimin Baek, Hyojin Kim, Jihoon Yoo, Juwon Shin, Kiyong Shin, Walid Amir, Gunwu Ju, Hyungjun Kim, Joohee Oh, Hyoungsub Kim, Taewoo

    Kim, Daehyun Kim

    "Vertical homo-junction In0.53Ga0.47As tunneling field-effect transistors with minimum subthreshold swing of 52 mV/decade"

    Solid State Electronics, 197, 108447 (2022)

2021

1. Hoijoon Kim, Taejin Park, Mirine Leem, Hyangsook Lee, Wonsik Ahn, Eunha Lee, Hyoungsub Kim

    "Sulfidation chracteristics of amorphous nonstoichiometric Mo-oxides for MoS2 synthesis"

    Applied Surface Science, 535, 147684 (2021)

2. Wonsik Ahn, Hyangsook Lee, Hoijoon Kim, Mirine Leem, Heesoo Lee, Taejin Park, Eunha Lee, Hyoungsub Kim

    "Area-selective atomic layer deposition of MoS₂ using simultaneous deposition and etching characteristics of MoCl₅"

    Physica Status Solidi - Rapid Research letters, 15, 2, 2000533 (2021)

3. Woohui Lee, Changmin Lee, Jinyong Kim, Jehoon Lee, Deokjoon Eom, Jae Chan Park, Tae Joo Park, Hyongsub Kim

    "Effect of H2S pre-annealing treatment on interfacial and electrical properties of HfO2/Si1-xGex (x=0-0.3)"

    Journal of Materials Chemistry C, 9, 5, 1829-1835 (2021)

4. Hyangsook Lee, Yeonchoo Cho, Kwang-Sik Jeong, Taejin Park, Mirine Leem, Wonsik Ahn, Hoijoon Kim, Jung-Hwa Kim, Heegu Kim,

    Mann-Ho Cho, Eunha Lee, Hyoungsub Kim, Sung Woo Hwang

    "3D-to-2D phase transformation through highly ordered 1D crystals: from transition-metal oxide to its dichalcogenides"

    Materials Today, 47, 38-44 (2021)

5. Fida Ali, Faisal Ahmed, Muhammad Taqi, Sekhar Babu Mitta, Tien Dat Ngo, Deok Joon Eom, Kenji Watanabe, Takashi Taniguchi,

    Hyoungsub Kim, Euyheon Hwang and Won Jong Yoo

    "Traps at the hBN/WSe2 interface and their impact on polarity transition in WSe2"

    2D Materials, 8, 3, 035027 (2021)

6. Hyangsook Lee, Duk-Hyun Choe, Sanghyun Jo, Jung-Hwa Kim, Hyun Hwi Lee, Hyun-Jun Shin, Yeehyun Park, Sunghun Kang, Yeonchoo

    Cho, Seontae Park, Taehwan Moon, Deokjoon Eom, Mirine Leem, Yunseok Kim, Jinseong Heo, Eunha Lee, Hyoungsub Kim

    "Unveiling the origin of robust ferroelectricity in sub-2 nm hafnium zirconium oxide film"

    ACS Applied Materials & Interfaces, 13, 30, 36499-36506 (2021)

7. Woohui Lee, Joohee Oh, Jae Hwan Chu, Sanggun Choi, Taewook Kang, Hyeyoung Chu, Hyoungsub Kim

    "Comparative study of C–V-based extraction methods of interface state density for a low-temperature polysilicon thin film"

    Materials Research Express, 8, 8, 085902 (2021)

8. Kwangsik Jeong, Hyangsook Lee, Changwoo Lee, Lim Hyeon Wook, Hyoungsub Kim, Eunha Lee, Mann-Ho Cho

    "Ferroelectric switching in GeTe through rotation of lone-pair electrons by Electric field-driven phase transition"

    Applied Materials Today, 24, 101122, 2021 (2021)

9. Changyu Park, Changmin Lee, Woohui Lee, Jehoon Lee, Jinyong Kim, Deokjoon Eom, Joohee Oh, Sung-Hae Lee, Hyoungsub Kim

    "Thermal stability of MgO film on Si grown by atomic layer deposition using Mg(EtCp)2 and H2"

    Ceramics International, 47, 22, 31583-31589 (2021)

2020

1. Byeong-Seon An, Yena Kwon, Jin-Su Oh, Changmin Lee, Seongheum Choi, Hyoungsub Kim, Miji Lee, Sangwoo Pae and Cheol-Woong

    Yang

    "Characteristics of amorphous carbon layer as a diffusion barrier for an advanced copper interconnect"

    ACS Applied Materials & Interfaces, 12, 2, 3104-3113 (2020)

2. Ji-Min Baek, Hyeon-Bhin Jo, Do-Young Yun, In-Geun Lee, Changmin Lee, Chan-Soo Shin, Hyoungsub Kim, Dae-Hong Ko, Tae-Woo

    Kim, Dae-Hyun Kim 

    "Vertical InGaAs tunnel-field-effect transistors by an electro-plating fin formation technique"

    Solid-State Electronics, 164, 107681 (2020)

3. Mirine Leem, Hyangsook Lee, Taejin Park, Wonsik Ahn, Hoijoon Kim, Eunha Lee, Hyoungsub Kim

    "Intriguing morphological evolution during chemical vapor deposition of HfS2 using HfCl4 and S on sapphire substrate"

    Applied Surface Science, 509, 144701 (2020)

4. Chandreswar Mahata, Changmin Lee, Youngseo An, Min-Hwi Kim, Suhyun Bang, Chae Soo Kim, Ji-Ho Ryu, Sungjun Kim,

    Hyoungsub Kim, Byung-Gook Park

    "Resistive switching and synaptic behaviors of an HfO2/Al2O3 stack on ITO for neuromorphic systems"

    Journal of Alloys and Compounds, 826, 154434 (2020)

5. Wonsik Ahn, Hyangsook Lee, Yeonchoo Cho, Kyung-Eun Byun, Hoijoon Kim, Mirine Leem, Heesoo Lee, Taejin Park, Eunha Lee,

    Hyeon-Jin Shin, Hyoungsub Kim

    "Introduction of an Al Seed Layer for Facile Adsorption of MoCl5 during Atomic Layer Deposition of MoS2"

    Physica Status Solidi A-Applications and Materials Science, 217, 15, 1901042 (2020)

6. Byungil Hwang, Nadeem Qaiser, Changmin Lee, Paolo Matteini, Seung Jo Yoo, Hyoungsub Kim

    "Effect of Al2O3/Alucone nanolayered composite overcoating on reliability of Ag nanowire electrodes under bending fatigue"

    Journal of Alloys and Compounds, 846, 15, 156420 (2020)

2019

1. Taejin Park, Mann-Ho Cho and Hyoungsub Kim

   "Relative activation energy for laser-induced crystallization of phase change materials"

    Japanese Journal of Applied Physics, 58, 1, 018004-1-3 (2019)

2. Jinbum Kim, Taejin Park, Seounghoon Lee, Siyoung Lee, Chulsung Kim, Sangjin Hyun, Yihwan Kim, Kihyun Hwang, and Hyoungsub Kim

    "Effect of Millisecond Annealing Temperature of Ni1-xPtxSi Formation on Leakage Current Characteristics of Static Random-Access                 Memory Cells"

    IEEE Transcations on Electron Devices, 66, 1, 389-394 (2019)

3. Jinbum Kim, Youngheum Jung, Sungho Lee, Seongpyo Hong, Seongheum Choi, Jinyong Kim, Taejin Park, Eunha Lee, Jung Yeon Won,        Hyung-Ik Lee, Yun Jae Lee, Bosung Kim, Joong Jung Kim, Yihwan Kim, Kihyun Hwang, Cheol-Woong Yang and Hyoungsub Kim

    "Lamella-structured Ni-silicide film formed by eutectic solidification"

    Journal of Alloys and Compounds, 771, 124-130 (2019)

4. Jinbum Kim, Hyangsook Lee, Jung-Hwa Kim, Ilgyou Shin, Jeongho Yoo, Seokhoon Kim, Seongheum Choi, Jinyong Kim, Taejin Park,

    Yihwan Kim, Kihyun Hwang, Eunha Lee, Hyoungsub Kim

    "Observation of heterostructure epitaxy of Pt-doped Ni-monosilicide on Si (001)"

    Microelectronic Engineering, 205, 14-19 (2019)

5. Taejin Park, Changdeuck Bae, Hyangsook Lee, Mirine Leem, Hoijoon Kim, Wonsik Ahn, Jinbum Kim, Eunha Lee, Hyunjung Shin, and            Hyoungsub Kim

    "Non-equilibrium fractal growth of MoS2 for electrocatalytic hydrogen evolution"

    CrystEngComm, 21, 3, 478-486 (2019)

6. Changmin Lee, Hyoungsub Kim, Byungil Hwang

    "Fracture behavior of metal oxide/silver nanowire composite electrodes under cyclic bending"

    Journal of Alloys and Compounds, 7732, 361-366 (2019)

7. Min Baik, Hang-Kyu Kang, Yu-Seon Kang, Kwang-Sik Jeong, Changmin Lee,  Hyoungsub Kim, Jin-Dong Song, Mann-Ho Cho

    "Effects of thermal and electrical stress on defect generation in InAs metal–oxide–semiconductor capacitor"

    Applied Surface Science, 478-486, 1161-1169 (2019)

8. Hoijoon Kim, Taejin Park, Seongjae Park, Mirine Leem, Wonsik Ahn, Hyangsook Lee, Changmin Lee, Eunha Lee, Jeong-Jun Jeong,              Seongjun Park, Yunseok Kim, Hyoungsub Kim

    "Ultrathin monolithic HfO2 formed by Hf-seeded atomic layer deposition on MoS2: Film characteristics and its transistor application"

    Thin Solid Films, 673, 112-118 (2019)

9. Jinbum Kim, Ilgyou Shin, Taejin Park, Jinyoung Kim, Seongheum Choi, Sungho Lee, Sengpyo Hong, Hyung-Ik Lee, Jung Yeon Won,              Taegon Ki, Yihwan Kim, Kihyun Hwang, Hoo-Jeong Lee, Hyoungsub Kim

    "Pt-doped Ni-silicide films formed by pulsed-laser annealing: Microstructural evolution and thermally robust Ni1-xPtxSi2                                     formation"

    Journal of Alloys and Compounds, 788, 1013-1020 (2019)

10. Dae-Kyoung Kim, Seok-Bo Hong, Kwangsik Jeong, Changmin Lee, Hyoungsub Kim and Mann-Ho Cho

      "P-N Junction Diode Using Plasma Boron-Doped Black Phosphorous for High-Performance Photovoltaic Devices"

      ACS Nano, 13, 2, 1683-1693 (2019)

11. Yoon-Ho Choi, Gi-Hyeon Kwon, Jae-Hun Jeong, Kwang-Sik Jeong, Hyeokjae Kwon, Youngseo An, Minju Kim, Hyoungsub Kim,                      Yeonjin Yi, Seongil Im, Mann-Ho Cho

      "Trap-assisted high responsivity of a phototransistor using bi-layer MoSe2 grown by molecular beam epitaxy"

      Applied Surface Science, 494, 37-45 (2019)

12. Changmin Lee, Sungho Choi, Youngseo An, Byeong-Seon An, Woohui Lee, Wan Oh, Deokjoon Eom, Jehoon Lee, Cheol-Woong

      Yang, and Hyoungsub Kim

      "Electrical properties of the HfO2/Al2O3 dielectrics stacked using single- and dual-temperature atomic-layer deposition processes on

      In0.53Ga0.47As"

      Semiconductor Science and Technology, 34, 10, 105018 (2019)

13. Kiseok Lee, Dongoh Kim, Chansic Yoon, Taejin Park, Sunghee Han, Yoosang Hwang, Kyupil Lee, Hokyu Kang, Hyoungsub Kim

      "Self-aligned double patterning for active trim contacts with anisotropic pattern pitches in sub-20 nm dynamic random access

       memories"

      Journal of Micro-Nanolithography, MEMS, and MOEMS, 18, 4, 40501 (2019)

2018

1. Sungho Choi, Jeongkeun Song, Youngseo An, Changmin Lee, and Hyoungsub Kim

   "Electrical Properties of HfO2/Al2O3 Dielectrics Fabricated on In0.53Ga0.47As by Using Atomic  Layer Deposition at Low Temperatures          (100-200°C)"

    Journal of the Korean Physical Society, 72, 2, 283-288 (2018)

2. Xiaochi Liu, Deshun Qu, Min Sup Choi, Changmin Lee, Hyoungsub Kim, and Won Jong Yoo

    "Homogeneous molybdenum disulfide tunnel diode formed via chemical doping"

    Applied Physics Letters, 112, 18, 183103 (2018)

3. Changmin Lee, Youngseo An, Sungho Choi and Hyoungsub Kim

    "Shallow doping effect of ZnO treatment using atomic layer deposition process on p-type In0.53Ga0.47As"

    Journal of Physics D: Applied Physics, 51, 24, 245106 (2018)

4. Hyangsook Lee, Yeonchoo Cho, Un Jeong Kim, Jaegwan Chung, Dongjin Yun, Hoijoon Kim, Eunha Lee, and Hyoungsub Kim

    "Environment-dependent and anion-vacancy-controlled reversible phase transition of MoS2 synthesized by chemical vapor deposition"

    2D Materials, 5, 4, 41002 (2018)

5. Seung-Hwan Kim, Gwang-sik Kim, June Park, Changmin Lee, Hyoungsub Kim, Jiyoung Kim, Joon Hyung Shim, and Hyun-Yong Yi

    "Novel Conductive Filamnet Metal-Interlayer-Seimconductor Contact Structure for Ultralow Contact Resistance Achievement"

    ACS Applied Materials & Interfaces, 10, 31, 26378-26386 (2018)

6. Hyena Kwak, Jaehyun Yang, Jung-gu Kang, Tae-Yil Eom, Hyongsunb Kim, Hoo-Jeong Lee and Chiwon Kang

    "Employment of rapid thermal annealing for solution-processed InGaZnO thin film transistors"

    Journal of Materials Science-Materials in Electronics, 29, 10, 8660-8665 (2018)

7. Hoijoon Kim, Giseok Lee, Stefan Becker, Ji-Seon Kim, Hyoungsub Kim and Byungil Hwang

    "Novel patterning of flexible and transparent Ag nanowire electrodes using oxygen plasma treatment"

    Journal of materials chemistry C, 5, 35, 9394-9398 (2018)

2017

1. Taejin Park, Hoijoon Kim, Mirine Leem, Wonsik Ahn, Seongheum Choi, Jinbum Kim, Joon Uh, Keewon Kwon, Seong-Jun Jeong,

    Seongjun Park, Yunseok Kim, and Hyoungsub Kim

    "Atomic layer deposition of Al2O3 on MoS2, WS2, WSe2, and h-BN: surface coverage and adsorption energy"

    RSC Advances, 7, 2, 884-889 (2017)

2. Jinbum Kim, Seongheum Choi, Taejin Park, Jinyong Kim, Chulsung Kim, Taeho Cha, Hyangsook Lee, Eunha Lee,

    Jung Yeon Won, Hyung-Ik Lee, Sangjin Hyun, Sunjung Kim, Dongsuk Shin, Yihwan Kim, Keewon Kwon, and Hyoungsub Kim

   "Chemically Homogeneous and Thermally Robust Ni1−xPtxSi Film Formed Under a Non-Equilibrium Melting/Quenching 

     Condition"

    ACS Applied Materials & Interfaces, 9, 1, 566-572 (2017)

3. Byungil Hwang, Youngseo An, Hyangsook Lee, Eunha Lee, Stefan Becker, Yong-Hoon Kim, and Hyoungsub Kim

    "Highly Flexible and Transparent Ag Nanowire Electrode Encapsulated with Ultra-Thin Al2O3: Thermal, Ambient, and Mechanical

      Stabilities"

     Scientific Reports, 7, 41336, 1-7 (2017)

4. Seongjae Park, Hoijoon Kim, Daehee Seol, Taejin Park, Mirine Leem, Hyunwoo Ha, Hyesung An, Hyun You Kim, Seong-Jun

    Jeong, Seongjun Park, Hyoungsub Kim, and Yunseok Kim

    "Evenly transferred single-layered graphene membrane assisted by strong substrate adhesion"

    Nanotechnology, 28, 14, 145706 (2017)

5. Rawat Jaisutti, Minkyung Lee, Jaeyoung Kim, Seungbeom Choi, Tae-Jun Ha, Jaekyun Kim, Hyungsub Kim, Sung Kyu Park,

    and Yong-Hoon Kim

    "Ultrasensitive Room-Temperature Operable Gas Sensors Using p‑Type Na:ZnO Nanoflowers for Diabetes Detection"

    ACS Applied Materials & Interfaces, 9, 10, 8796-8804 (2017)

6. Hang-Kyu Kang, Yu-Seon Kang, Dae-Kyoung KIm, Min Baik, Jin-Dong Song, Youngseo An, Hyoungsub Kim, and Mann-Ho Cho

    "Al2O3 Passivation Effect in HfO2·Al2O3 Laminate Structures Grown on InP Substrates"

    ACS Applied Materials & Interfaces, 9, 20, 17526-17535 (2017)

7. Byungil Hwang, Minha Kim, Sung Min Cho, Sefan Becker, Young-Hoon Kim, Hyoungsub Kim

    "Embedded silver-nanowire electrode in an acrylic polymer–silicate nanoparticle composite for highly robust flexible devices"

    Journal of Applied Polymer Science, 134, 33, 45203 (2017)

8. Sungho Choi, Youngseo An, Changmin Lee, Jeongkeun Song, Manh-Cuong Nguyen, Young-Chul Byun, Rino Choi, Paul C. Mclntyre

    and Hyungsub Kim

    "Effects of H2 High-pressure Annealing on HfO2/Al2O3/In0.53Ga0.47As Capacitors: Chemical Composition and Electrical

     Characteristics"

    Scientific Reports, 7, 9769, 1-7 (2017)

9. Deshun Qu, Xiaochi Liu, Ming Huang, Changmin Lee, Faisal Ahmed, Hyungsub Kim, Rodney S. Ruoff, James Hone, and Won Jong Yoo

    "Carrier-Type Modulation and Mobility Improvement of Thin MoTe2"

    Advanced Materials, -, -, 1606433 (2017)

10. Min Baik, Hang-Kyu Kang, Yu-Seon Kang, Kwang-Sik Jeong, Youngseo An, Seonghum Choi, Hyoungsub Kim, Jin-Dong Song,

      and Mann-Ho Cho

      "Electrical properties and thermal stability in stack structure of HfO2/Al2O3/InSb by atomic layer deposition"

      Scientific Reports, 7, 11337, 1-11 (2017)

11. Jinyong Kim, Seongheum Choi, Jinbum Kim, Hyangsook Lee, Byeongseon An, Hyunjung Lee, Choeun Lee, Cheol-Woong Yang

      and Hyoungsub Kim

      "Doping and strain effects on the microstructure of erbium silicide on Si:P"

      Journal of Alloys and Compounds, 727, 728-734 (2017)

12. Taejin Park, Mirine Leem, Hyangsook Lee, Wonsik Ahn, Hoijoon Kim, Jinbum Kim, Eunha Lee, Yong-Hoon Kim, and Hyoungsub Kim

      "Synthesis of Vertical MoO2/MoS2 Core–Shell Structures on an Amorphous Substrate via Chemical Vapor Deposition"
      Journal of Physical Chemistry C, 121, 49, 27693 (2017)

2016

1. Jaewoo Shim, Gwangwe Yoo, Dong-Ho Kang, Woo-Shik Jung, Young-Chul Byun, Hyoungsub Kim, Won Tae Kang, Woo Jong Yu,

    Hyun-Yong Yu, Yongkook Park, and Jin-Hong Park
  "Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions"

    IEEE Electron Device Letters, 37, 1, 4-7 (2016)

2. Cheol Hyoun Ahn, Hyung Koun Cho, and Hyoungsub Kim

    "Carrier confinement effect-driven channel design and achievement of robust electrical/photostability and high mobility in oxide thin-film

    transistors"
    Journal of Physical Chemistry C, 4, 725-735 (2016)

 

3. Sung Woon Cho, Myoungho Jeong, Jun Hyeon Kim, Yong Hun Kwon, Hyoungsub Kim, Jeong Yong Leeb and Hyung Koun Cho
  "A combinatorial approach to solution-processed InGaO3IJZnO)m superlattice films: growth mechanisms and their thermoelectric properties"
  CrystEngComm, 18, 5, 807-815 (2016)

 

4. Seong-Jun Jeong, Yeahyun Gu, Jinseong Heo, Jaehyun Yang, Chang-Seok Lee, Min-Hyun Lee, Yunseong Lee, Hyoungsub Kim,

    Seongjun Park & Sungwoo Hwang

    “Thickness scaling of atomic-layerdeposited HfO2 films and their application to wafer-scale graphene tunnelling transistors”

    Scientific Reports, 6, 20907, 1-12 (2016)

5. Chandreswar Mahata, Youngseo An, Sungho Choi, Young-Chul Byun, Dae-Kyoung Kim, Taeyoon Lee, Jiyoung Kim, Mann-Ho Cho, and

    Hyoungsub Kim
    “Electrical properties of the HfO2-Al2O3 nanolaminates with homogeneous and graded compositions on InP”
    Current Applied Physics, 16, 3, 294-299 (2016)

6. Yu-Seon Kang, Hang-Kyu Kang, Dae-Kyoung Kim, Kwang-Sik Jeong, Min Baik, Youngseo An, Hyoungsub Kim, Jin-Dong Song,

    and Mann-Ho Cho

    "Structural and Electrical Properties of EOT HfO2 (<1 nm) Grown on InAs by Atomic Layer Deposition and Its Thermal Stability"

    ACS Applied Materials & Interfaces, 8, 11, 7489-7498 (2016)

7. Jaehyun Yang, Hyena Kwak, Youngbin Lee, Yu-Seon Kang, Mann-Ho Cho, Jeong Ho Cho, Yong-Hoon Kim, Seong-Jun Jeong,

    Seongjun Park, Hoo-Jeong Lee, and Hyoungsub Kim

    "MoS2−InGaZnO Heterojunction Phototransistors with Broad Spectral Responsivity"

    ACS Applied Materials & Interfaces, 8. 13, 8576-8582 (2016)

8. Youngbin Lee, Jaehyun Yang, Dain Lee, Yong-Hoon Kim, Jin-Hong Park, Hyoungsub Kim, and Jeong Ho Cho

    "Trap-induced photoresponse of solution-synthesized MoS2"

    Nanoscale, 8, 17, 9193-9200 (2016)

9. Ji-Hyuk Choi, Jungwoo Kim, Soong Ju Oh, Daekyoung Kim, Youg-Hoon Kim, Heeyeop Chae, and Hyoungsub Kim

    "Optical and Electrical Properties of ZnO Nanocrystal Thin Films Passivated by Atomic Layer Deposited Al2O3"

    Metals and Materials International, 22, 4, 723-729 (2016)

10. Jayapal Raja, Cam Phu Thi Nguyen, Changmin Lee, Nagarajan Balaji, Somenath Chatterjee, Kyungsoo Jang,

      Hyoungsub Kim, and Junsin Y

      "Improved Data Retention of InSnZnO Nonvolatile Memory by H2O2 Treated Al2O3 Tunneling Layer: A Cost-Effective Method"

      IEEE ELECTRON DEVICE LETTERS, 37, 10, 1272-1275 (2016)

11. Seongheum Choi, Jinyong Kim, Juyun Choi, Sungkil Cho, Minhyeong Lee, Eunjung Ko, Il Cheol Rho, Choon Hwan Kim, Yunseok Kim,

      Dae-Hong Ko, Hyoungsub Kim

      "Microstructural properties of Ni-silicide films formed on epitaxially grown strained Si:P layer"

      Microelectronic Engineering, 165, 1-5 (2016)

12. Daekyoung Kim, Yan Fu, Jungwoo Kim, Ki-heon Lee, Hyoungsub Kim, Heesun Yang, Heeyeop Chae

      "Improved electroluminescence of quantum dot light-emitting diodes enabled by a partial ligand exchange with benzenethiol"

      Nanotechnology, 27, 24, 245203 (2016)

2015

1. Sang A. Han, Kang Hyuck Lee, Tae-Ho Kim, Wanchul Seung, Seok Kyeong Lee, Sungho Choi, Brijesh Kumar, Ravi Bhatia, Hyeon-Jin Shin,

    Woo-Jin Lee, SeongMin Kim, Hyoung Sub Kim, Jae-Yong Choi, Sang-Woo Kim

    "Hexagonal boron nitride assisted growth of stoichiometric Al2O3 dielectric on graphene for triboelectric nanogenerators"

    Nano Energy, 12, 556-566 (2015)

2. Yu-Seon Kang, Dae-Kyoung Kim, Hang-Kyu Kang, Sangwan Cho, Sungho Choi, Hyoungsub Kim, Jung-Hye Seo, Jouhahn Lee,

    Mann-Ho Cho

    "Defect states below the conduction band edge of HfO2 grown on InP by atomic layer deposition"
    Journal of Physical Chemistry C, 119, 11, 6001-6008 (2015)
 

3. Jaehyun Yang, Yeahyun Gu, Eunha Lee, Hyangsook Lee, Sang Han Park, Mann-Ho Cho, Yong Ho Kim, Yong-Hoon Kima, Hyoungsub Kim
    "Wafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol

    solvent system"
    Nanoscale, 7, 20, 9311-9319 (2015)

4. Sekwon Na, Jun-gu Kang, Juyun Choi, Nam-Suk Lee, Chan Gyung Park, Hyoungsub Kim, Seok-Hee Lee and Hoo-Jeong Lee

    “Silicidation of Mo-alloyed ytterbium: Mo alloying effects on microstructure evolution and contact properties”

    Acta Materialia, 92, 15, 1-7 (2015)

5. Seongheum Choi, Juyun Choi, Hyoungsub Kim

    “Formation of Er-germanosilicide films on strained Si1-xGex with different Ge contents”

    Physica Status Solidi A, 212, 4, 775-779 (2015)

6. Dae-Kyoung Kim, Yu-Seon Kang, Kwang-Sik Jeong, Hang-Kyu Kang, Sang Wan Cho, Kwun-Bum Chung, Hyoungsub Kim and

    Mann-Ho Cho

    "Effects of spontaneous nitrogen incorporation by a 4H-SiC(0001) surface caused by plasma nitridation"

    Journal of Materials Chemistry C, 3, 19, 5078-5088 (2015)

7. Youngseo An, Chandreswar Mahata, Changmin Lee, Sungho Choi, Young-Chul Byun, Yu-Seon Kang, Taeyoon Lee, Jiyoung Kim,

    Mann-Ho Cho, and Hyoungsub Kim

    “Electrical and band structural analyses of Ti1−xAlxOy films grown by atomic layer deposition on p-type GaAs”

    Journal of Physics D: Applied Physics, 48, 41, 415302 (2015)

8. Yong Hun Kwon, Hyun Woo Do, Hyoungsub Kim, and Hyung Koun Cho

    “Composition Control of CuInSe2 Thin Films Using Cu/In Stacked Structure in Coulometric Controlled Electrodeposition Process”

    Journal of Nanoscience and Nanotechnology, 15, 10, 1533-4880 (2015)

9. J.W.Ma, W.J.Lee, J.M.Bae, K.S.Jeong, S.H.Oh, J.H.Kim, S.-H.Kim, J.-H.Seo, J.-P.Ahn, H.Kim, and M.-H.Cho
   "Carrier Mobility Enhancement of Tensile Strained Si and SiGe Nanowires via Surface Defect Engineering"

    Nanoletters, 15, 11, 7204-7210 (2015)

2014

1. Jungwoo Kim, Ji-Hyuk Choi, Heeyeop Chae, and Hyoungsub Kim

    "Effect of indium doping on low-voltage ZnO nanocrystal field-effect transistors with ion-gel gate dielectric"

    Japanese Journal of Applied Physics, 53, 7, pp 071101-1-6 (2014)

2. Young-Chul Byun, Sungho Choi, Youngseo An, Paul C. McIntyre, and Hyoungsub Kim

    "Tailoring the Interface Quality between HfO2 and GaAs via in Situ ZnO Passivation Using Atomic Layer Deposition"

    ACS Applied Materials & interfaces, 6, 13, pp 10482-10488 (2014)

3. Seung Muk Lee, Soo Min Hwang, Soon Yong Hwang, Tae Woong Kim, Sang Hyub Lee, Geun Chul Park, Ju Yun Choi, Jae Jin Yoon,

    Tae Jung Kim, Young Dong Kim, Hyoungsub Kim, Jun Hyung Lim, Jinho Joo
    "Influences of rapid thermal process on solution-deposited Ti-silicate/Si films: Phase segregation, composition and interface changes,

    and dielectric properties"
    Materials Chemistry and Physics, 145, 1-2, pp 168-175 (2014)

4. In-Su Mok, Jonggi Kim, Kyumin Lee, Youngjae Kim and Hyunchul Sohn, Hyoungsub Kim

    “Effect of Crystallinity on the Resistive Switching Behavior of HfAlOx Films”

    Journal of the Korean Physical Society, 64, 3, pp 419-423 (2014)

5. Juyun Choi, Seongheum Choi, Yu-Seon Kang, Sekwon Na, Hoo-Jeong Lee, Mann-Ho Cho, and Hyoungsub Kim

    “Defect-Free Erbium Silicide Formation Using an Ultrathin Ni interlayer”

    ACS Applied Materials & interfaces, 6, 16, pp 14712-14717 (2014)

6. Kwang Sik Jeong, Jinho Song, Donghyeok Lim, Myung Soo Lee, Hyoungsub Kim, Mann-Ho Cho

    "Structural evolution and defect control of yttrium-doped ZrO2filmsgrown by a sol–gel method"

    Applied Surface Science, 320, pp 128-137 (2014)

7. Yu-Seon Kang, Dae-Kyoung Kim, Hang-Kyu Kang, Kwang-Sik Jeong, Mann-Ho Cho, Dae-Hong Ko, Hyoungsub Kim, Jung-Hye Seo,

    Dong-Chan Kim

    “Effects of Nitrongen Incorporation in HfO2 Grown on InP by Atomic Layer Deposition: An Evolution in Structural, Chemical, and

    Electrical Characteristics”

    ACS Applied Materials & interfaces, 6, 6, pp 3896-3906 (2014)

 

2013

1. Jihoon Lee, Jungwoo Kim, Hyoungsub Kim, Young Min Bae, Kyeong-Hee Lee and Hyoung J Cho

    "Effect of thermal treatment on the chemical resistance of polydimethylsiloxane for microfluidic devices"

    Journal of Micromechanics and Microengineering, 23, 035007-1-7 (2013)

2. Soonjae Kim, Sekwon Na, Haseok Jeon, Sunho Kim, Byunghoon Lee, Jaehyun Yang, Hyoungsub Kim and Hoo-Jeong Lee

    "Effects of Sn doping on the growth morphology and electrical properties of ZnO nanowires"

    Nanotechnology, 24, 065703 (2013)

3. Chandreswar Mahata, Young-Chul Byun, Chee-Hong An, Sungho Choi, Youngseo An, and Hyoungsub Kim

    "Comparative Study of Atomic-Layer-Deposited Stacked (HfO2/Al2O3) and Nanolaminated (HfAlOx) Dielectrics on In0.53Ga0.47As"

    ACS Applied Materials & interfaces, 5 (10), pp 4195-4201 (2013)

4. Jaehyun Yang, Sunkook Kim, Woong Choi, Sang Han Park, Youngkwon Jung, Mann-Ho Cho and Hyoungsub Kim

    “Improved Growth Behavior of Atomic-Layer-Deposited High-k Dielectrics on Multilayer MoS2 by Oxygen Plasma Pretreatment”

    ACS Applied Materials & interfaces, 5 (11), pp 4739-4744 (2013)

5. Chee-Hong An, Chandreswar Mahata, Young-Chul Byun and Hyoungsub Kim

    “Atomic-layer-deposited (HfO2)1-x(Al2O3)x nanolaminate films on InP with different Al2O3 contents”

    Journal of Physics D : Applied Physics, 46, 275301 (2013)

6. Chee-Hong An, Chandreswar Mahata, Young-Chul Byun, Myung Soo Lee, Yu Seon Kang, Mann-Ho Cho and Hyoungsub Kim

    "Electrical Characteristics of HfO2 films on InP with different atomic-layer-deposition temperatures"

    Physica Status Solidi A, 7, 1381-1385 (2013)

7. Juyun Choi, Seongheum Choi, Jungwoo Kim, Sekwon Na, Hoo-Jeong Lee, Seok-Hee Lee and Hyoungsub Kim

    “Silicide Formation Process of Er films with Ta and TaN capping layers”
    ACS Applied Materials & interfaces, 5 , pp 12744-12750 (2013)

8. Mi Ran Moon, Haseok Jeon, Sekwon Na, Sunho Kim, Donggeun Jung, Hyoungsub Kim, Hoo-Jeong Lee,

    “Microstructure and electrical properties of XInZnO (X = Ti, Zr, Hf) films and device performance of their thin film transistors—The

    effects of employing Group IV-B elements in place of Ga”
  Journal of Alloys and compounds, 563 , pp 124-129 (2013)

9. Yu-Seon Kang, Dae-Kyoung Kim, Kwang-Sik Jeong, Mann-Ho Cho, Chung Yi Kim, Kwun-Bum Chung,Hyoungsub Kim, and

    Dong-Chan Kim
  "Structural Evolution and the Control of Defects in Atomic Layer Deposited HfO2−Al2O3 Stacked Films on GaAs"
  ACS Applied Materials & interfaces, 5 , pp 1982-1989 (2013)

10. Kyungsoo Jang, Jayapal Raja, Jiwoong Kim, Cheolmin Park, Youn-Jung Lee, Jaehyun Yang, Hyoungsub Kim and Junsin Yi

      "Bias-stability improvement using Al2O3 interfacial dielectrics in a-InSnZnO thin-film transistors"
      Semiconductor Science and Technology, 28, 8, 085015 (2013)

11. Jae-Wook Lee, Hyung-Kyu Kim, Jee-Hwan Bae, Min-Ho Park, Hyoungsub Kim, Jiho Ryu, and Cheol-Woong Yang

      "Enhanced Morphological and Thermal Stabilities of Nickel Germanide with an Ultrathin Tantalum Layer Studied by Ex Situ and In Situ

      Transmission Electron Microscopy"
      Microsc. Microanal., 19, 114-118 (2013)

12. Haseok Jeon, Jury Song, Sekwon Na, Miran Moon, Junhyung Lim, Jinho Joo, Donggun Jung, Hyungsub Kim, Jinsoo Noh,

      Hoo-Jeong Lee

      "A study on the microstructural and chemical evolution of In–Ga–Zn–O sol–gel films and the effects on the electrical properties"

      Thin Solid Films, 540, 31-35 (2013)

13. Seung Muk Lee, Soo Min Hwang, Soon Yong Hwang, Tae Woong Kim, Ju Yun Choi, Joong Keun Park, Tae Jung Kim,

      Young Dong Kim, Hyoungsub Kim, Jun Hyung Lim, Jinho Joo

      "Application of rapid thermal process to solution-processed Ti-silicate films for enhancing permittivity without losing amorphous

      nature"
      Current Applied Physics, 13, S2, S41-S44 (2013)

14. Yu-Seon Kang, Dae-Kyoung Kim, Mann-Ho Cho, Jung-Hye Seo, Hyun Kyong Shon, Tae Geol Lee, Young Dae Cho, Sun-Wook Kim,

      Dae-Hong Ko, and Hyoungsub Kim

      "A study on the microstructural and chemical evolution of In–Ga–Zn–O sol–gel films and the effects on the electrical properties"
      Phys. Status Solidi A, 210, 8, 1612-1617 (2013)

2012

1. Jaehyun Yang, Joong Keun Park, Sunkook Kim, Woong Choi, Sangyoon Lee, and Hyoungsub Kim
   "Atomic-layer-deposited ZnO thin-film transistors with various gate dielectrics"
   Physica Status Solidi A, 10, 2087-2090 (2012)

 

2. Young-Chul Byun, Chandreswar Mahata, Chee-Hong An, Jungwoo Oh, Rino Choi and Hyoungsub Kim

    "Interfacial and electrical properties of HfO2 gate dielectrics grown on GaAs by atomic layer deposition using different oxidants"
   Journal of Physics D : Applied Physics, 45, 435305 (2012)

3. Young-Chul Byun, Chandreswar Mahata, Chee-Hong An,and Hyoungsub Kim

    "Starting layer dependence of the atomic-layer-deposited HfAlOx films on GaAs"
   Semiconductor Science and Technology, 27, 105026 (2012)

4. Eunkyoung Nam, Seungsik Oh, Donggeum Jung, Hyoungsub Kim, Heeyeop Chae, and Junsin Yi

    "Organic photovoltaic devices with the bilayer cathode interfacial structure of pyromellitic dianhydride and lithium fluoride"
   Semiconductor Science and Technology, 27, 105004 (2012)

 

5. Sunkook Kim, Aniruddha Konar, Wan-Sik Hwang, Jong Hak Lee, Jiyoul Lee, Jaehyun Yang, Changhoon Jung, Hyoungsub Kim,

    Ji-Beom Yoo, Jae-Young Choi, Yong Wan Jin, Sang Yoon Lee, Debdeep Jena, Woong Choi, Kinam Kim
   "High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals"
   Nature Communications, 3, 1011, (2012)

6. Chee-Hong An, Young-Chul Byun, Mann-Ho Cho and Hyoungsub Kim

    "Thermal instability of HfO2 on InP structure with ultrathin Al2O3 interface passivation layer"
   physica status solidi (RRL)- Rapid Research Letters, 6, 247-249 (2012)

7. Chee-Hong An, Young-Chul Byun, Myung Soo Lee and Hyoungsub Kim

    "Impact of substrate temperature and film thickness on the interfacial evolution during atomic layer depostion of HfO2 on InP"
   physica status solidi (RRL)- Rapid Research Letters, 6, 211-213 (2012)

8. Myung Soo Lee, Sang Han Park, Mann-Ho Cho and Hyoungsub Kim

    "Solution-deposited GdCeOx thin film : Microstructure, band structure, and dielectric property"
   Materials Research Bulletin, 47, 1423 (2012)

9. Myung Soo Lee, Sungho Choi, Chee-Hong An and Hyoungsub. Kim

    "Resistive switching characteristics of solution-deposited Gd, Dy, and Ce-doped ZrO2 films"

    Applied Physics Letters, 100, 143504 (2012)

10. Young-Chul Byun, Chee-Hong An, Seok-Hee Lee, Mann-Ho Cho and Hyoungsub. Kim

      "Thermal Stability of ALD-HfO2/GaAs Pretreated with Trimethylaluminium"

      J. Electrochem. Soc., 159, 1, G6-G10, (2012)

11. Jae Jin Lee, Yunsang Shin, Juyun Choi, Hyoungsub Kim, Sangjin Hyun, Siyoung Choi, Byung Jin Cho, Seok-Hee Lee

      " Reduction of charge trapping in HfO2 film on a Ge substrate by trimethylaluminum pretreatment"
      Phys. Status Solidi RRL, 6, 11, 439-441, (2012)

12. Mi Ran Moon, Sekwon Na, Haseok Jeon, Tae Hun Lee, Donggeun Jung, Hyoungsub Kim, Jun-Mo Yang and Hoo-Jeong Lee

      "The effects of a combined thermal treatment of substrate heating and post-annealing on the microstructure of InGaZnO films and the

      device performance of their thin film transistors "
      Surf. Interface Analysis, 44, 1431-1435, (2012)

13. Sekwon Na, Hwayoul Choi, Byunghoon Lee, Juyun Choi, Yujin Seo, Hyoungsub Kim, Seok-Hee Lee and Hoo-Jeong Lee

      "A study on the formation mechanism of ytterbium silicide for Schottky contact applications "
      Surf. Interface Analysis. 44, 1497-1502 (2012)

14. Seung Muk Lee, Soo Min Hwang, Jun Hyuk Choi, Kyung Park, Hyoungsub Kim, Jun Hyung Lim, and Jinho Joo

      "Effects of Heating Time and Intermediate Heating on Sol–Gel-Processed ZrO2 Thin Films"
      Jap. J. Appl. Phys., 51, 09MF13-1 (2012)

15. Hoonbae Kim, Myung Hoon Ha, Donggeun Jung, Heeyeop Chae, Hyoungsub Kim

      "Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films"
      Materials Research Bulletin, 47, 3008-3010 (2012)

16. Jae-Wook Lee, Jee-Hwan Bae, Ji-Hye Hwang, Hyung-Kyu Kim, Min-Ho Park, Hyoungsub Kim, Cheol-Woong Yang

      "Dynamic study on microstructural evolution of nickel germanide utilizing zirconium interlayer"
      Microelectronic Engineering. 89, 23-26 (2012)

 

17. Y. S. Kang, C. Y. Kim, M.-H. Cho, C.-H. An, H. Kim, J. H. Seo,C. S. Kim, T. G. Lee, and D.-H. Ko

      "Interfacial Reactions between HfO2 Films Prepared by Atomic-Layer-Deposition and an InP Substrate Using Postnitridation with NH3

      Vapor"
      Electrochemical Solid States Letter, 15, 4, G9-G11 (2012)

2011

1. Chee-Hong An, Young-Chul Byun, Myung Soo Lee and Hyoungsub Kim

    "Thermal Stabilities of ALD-HfO2 Films on HF- and (NH4)2S-Cleaned InP"

    J. Electrochem. Soc., 158, 12, G242-G245 (2011)


2. Kyung Park, Ju-Yun Choi, Hoo-Jeong Lee, Jang-Yeon Kwon and Hyoungsub. Kim

    "Thin film transistor using amorphous InGaZnO films as both channel and source/drain electrodes"
    Japanese Journal of Applied Physics, 50, 069504 (2011)

3. Tea Wan Kim, Tae-Young Jang, Donghyup Kim, Jung Woo Kim, Jae Kyeong Jeong, Rino Choi, Myung Soo Lee, Hyoungsub. Kim

    "Effect of La incorporation on reliability characteristics of MOS capacitors with hafnium based high-k dielectrics"
    Microelectronic Engineering, 2011

 

4. C.Y.Kim, K. S. Jeong, Y. S. Kang, S. W. Cho, M.-H.Cho, K. B. Chung, D.-H. Ko, Y. Yi and H. Kim

    "Defect states in epitaxial HfO2 films induced by atomic transport from n-GaAs(100) substrate"
    Journal of Applied Physics 109, 114112 (2011)

5. Hyun Ae Lee, Young-Chul Byun, Umesh Singh, Hyoung J. Cho, and Hyoungsub Kim

    "Surface Modification of Carbon Post Arrays by ALD of ZnO Film"
    Journal of Nanoscience and Nanotechology, 11, 7322 (2011)

6. Jungwoo Kim, Nam Hun Kim, Hyoungsub Kim, Donggeun Jung, and Heeyeop Chae

    "Simultaneous Plasma and Thermal Treatemtns of ITO Surfaces for Organic Solar Cells"
    Journal of Nanoscience and Nanotechology, 2011

7. Jaehyun Yang, Myung Soo Lee , Hoo-Jeong Lee and Hyoungsub Kim

    "Hybrid ZnO nanowire networked field-effect transistor with solution-processed InGaZnO film"

    Appl. Phys. Lett., 98, 253106 (2011)

8. Jaehyun Yang, Myung Soo Lee, Kyung Park, Mi Ran Moon, Donggeun Jung, Hyoungsub Kim, Hoo-Jeong Lee
    "Effect of the microstructure of ZnO seed layer on the ZnO nanowire density"
    J. Mater. Res. 26, 10, 1292 (2011)

9. Chee-Hong An, Jaehyun Yang, Ying Eui Lee, Chul-Hwan Kim, Eunkyoung Nam, Donggeun Jung, Mann-Ho Cho, and Hyoungsub Kim

    "A Triple-Layered Microcavity Structure for Electriphoretic Image Display"
    IEEE Trans. Electron Devices, 58, 4, 1116 (2011)

10. Young-Chul Byun, Chee-Hong An, Ju Yun Choi, Chung Yi Kim, Mann-Ho Cho, and Hyoungsub Kim

      "Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time"

      J. Electrochem. Soc., 158, 6, G141-G145 (2011)

11. Myung Soo Lee, Chee-Hong An, Kyung Park, Ju-Yun Choi, and Hyoungsub Kim

      "Effect of Y, Gd, Dy, and Ce Doping on the Microstructural and Electrical Properties of Sol-Gel-Deposited ZrO2 Film"

      J. Electrochem. Soc., 158, 6, G133-G136 (2011)

12. Sang Han Park, Hyo Jin Kim, Mann-Ho Cho, Yeonjin Yi, Sang Wan Cho, Jaehyun Yang, and Hyoungsub Kim

      "The effect of ZnO surface conditions on the electronic structure of the ZnO/CuPc interface "
      Appl. Phys. Lett., 98, 082111-1-3 (2011)

13. Dong Chan Kim, Ju Ho Lee, Sanjay Kumar Mohanta, Hyung Koun Cho, Hyoungsub Kim and Jeong Yong Lee

      "Density and aspect ratio controlled MgZnO nanowire arrays by spontaneous phase separation effect "
      Cryst.eng.comm., 13, 3, 813 (2011)

 

14. Soo Min Hwang, Seung Muk Lee, Kyung Park, Myung Soo Lee, Jinho Joo, Jun Hyung Lim, Hyoungsub Kim, Jae Jin Yoon,

      and Young Dong Kim

      "Effect of annealing temperature on microstructural evolution and electrical properties of sol-gel processed ZrO2/Si films "
      Appl. Phys. Lett.., 98, 022903-1-3 (2011)

15. Cheol Hyoun Ahn, Bo Hyun Kong, Hyoungsub Kim, and Hyung Koun Cho

      "Improved Electrical Stability in the Al Doped ZnO Thin-Film-Transistors Grown by Atomic Layer Deposition "
      J. Electrochem. Soc., 158, H170-H173 (2011)

2010

1. Jong Hyun Shim, Jun Hyuk Choi, Chang Min Lee, Kyung Park, Jinho Joo, Hyungsub Kim and Hoo-Jeong Lee, Jun Hyung Lim,

    Mi Ran Moon and Donggeun Jung
  "Fabrication and Comparison of the Properties of SnInZnO and InZnO TFTs Processed by Using the Sol-gel Method"
    J. Korean. Phys. Soc., 57,6,1847-1851 (2010)


2. Jun Hyuk Choi, Jong Hyun Shim, Soo Min Hwang, Jinho Joo, Kyung Park, Hyoungsub Kim, Hoo-Jeong Lee, Jun Hyung Lim, Mi Ran Moon   

    and Donggeun Jung

    "Effect of Sintering Time at Low Temperature on the Properties of IGZO TFTs Fabricated by Using the Sol-gel Process"
  J. Korean. Phys. Soc., 57,6,1836-1841 (2010)

3. Dong Chan Kim, Ju Ho Lee, Sanjay Kumar Mohanta, Hyung Koun Cho, Hyoungsub Kim and Jeong Yong Lee

    " Density and aspect ratio controlled MgZnO nanowire arrays by spontaneous phase separation effect"
  Crystengcomm. (2010)


4. C. Y. Kim, Y. S. Kang, S. Y. Lee, M.-H. Cho, K. B. Chung, H. Kim, S. Na, H. J. Lee, and H. J. Yun

    "Effect of interfacial reactions between atomic-layer-deposited HfO2 films and n-GaAs (100) substrate using postnitridation with NH3 vapor"
  Appl. Phys. Lett., 97,92113 (2010)


5. Y. S. Kang, C. Y. Kim, M. -H. Cho, K. B. Chung, C. -H. An, H. Kim, H. J. Lee, C. S. Kim, and T. G. Lee

    "Thickness dependence on crystalline structure and interfacial reactions in HfO2 films on InP (001) grown by atomic layer deposition"
  Appl. Phys. Lett. (2010)

6. Mi Ran Moon, Sekwon Na, Haseok Jeon, Chee-Hong An, Kyung Park, Donggeun Jung, Hyoungsub Kim, Young-Boo Lee,

    and Hoo-Jeong Lee

    "Effects of Substrate Heating on the Amorphous Structure of InGaZnO Films and the Electrical Properties of Their Thin Film Transistors"
  Appl. Phys. Express , 3, 111101 (2010)


7. Cheol Hyoun Ahn, Hyoungsub Kim, Hyung Koun Cho

    "Deposition of Al doped ZnO layers with various electrical types by atomic layer deposition"
  Thin Solid Films ,519, 2, 747 (2010)


8. Y. J. Cho, J. W. Mah, C. Y. Kim, H. Kim, H. J. Lee, H. J. Kang, D. W. Moon, S.-O. Kim, and M.-H Cho

    "Change in Band Alignment of Nitrided Hf-Silicate Films Grown on Ge(001) Using Gaseous NH3"
  Electrochem. Soc., 13, 5, G33 (2010)


9. Eunkyoung Nam, Mi Ran Moon, Donggeun Jung, Sungwoo Lee, Heeyeop Chae, Jae Hyun Cho, Junsin Yi, Sang Han Park, Mann-Ho Cho,

    and Hyoungsub Kim

    "Pergormance Improvement of the Organic Light-Emitting Diodes by Using a LiF/Pyromellitic Dianhydride Stacked Cathode Interfacial

    Layer"
    Electrochem. Soc., 157, 12, J425 (2010)


10. Myung Soo Lee, Chee-Hong An, Jun Hyung Lim, Jin-Ho Joo, Hoo-Jeong Lee, and Hyoungsub Kim

      "Characteristics of Ce-Doped ZrO2 Dielectric Films Prepared by a Solution Deposition Process"
      J. Electrochem. Soc., 157, 6, G142 (2010)


11. Eunkyoung Nam, Mi Ran Moon, Jungwoo Kim, Donggeun Jung, Hyoungsub Kim, Heeyeop Chae, Junsin Yi,

      "Effects of the pyromellitic dianhydride cathode interfacial layer on characteristics of organic solar cells based on poly

      (3-hexylthiophene-2,5-diyl) and [6,6]-phenyl C61 butyric acid methylester"
      J. Mater. Res. 25, 5, 866 (2010)


12. Kyung Park, Chee-Hong An, Byung-Il Hwang, Hoo-Jeong Lee, and Hyoungsub Kim

      "A study on materials interactions between Mo electrode and InGaZnO active layer in InGaZnO-based thin film transistors"
      J. Mater. Res. 25, 2, 266 (2010)

2009

  1. Sungwoo Lee, Jihyung Woo, Eunkyoung Nam, Donggeun Jung, Jaeyoung Yang, Heeyeop Chae, and Hyoungsub Kim,
    "Effects of Deposition Plasma Power on Properties of Low Dielectric-Constant Plasma Polymer Films Deposited Using Hexamethyldisiloxane and 3,3-Dimethyl-1-butene Precursors",
    Jpn. J. Appl. Phys, 48, 106001 (2009)
     

  2. C. Y. Kim, S. W. Cho, M.-H. Cho, K. B. Chung, D. C. Suh, D.-H. Ko, C.-H. An, H. Kim, and H. J. Lee,
    "Changes in the structure of an atomic-layer-deposited HfO2 film on a GaAs (100) substrate as a function of postannealing temperature",
    Appl. Phys. Lett., 95, 042903 (2009)
     

  3. Jun Hyung Lim, Jong Hyun Shim, Jun Hyuk Choi, Jinho Joo, Kyung Park, Haseok Jeon, Mi Ran Moon, Donggeun Jung, Hyoungsub Kim, and Hoo-Jeong Lee,
    "Solution-processed InGaZnO-based thin film transistors for printed electronics applications",
    Appl. Phys. Lett., 95, 012108 (2009)
     

  4. Chee-Hong An, Myung Soo Lee, Ju-Yun Choi, and Hyoungsub Kim,
    "Change of the trap energy levels of the atomic layer deposited HfLaOx films with different La concentration",
    Appl. Phys. Lett., 94, 262901 (2009)
     

  5. Mi Ran Moon, Eunkyoung Nam, Jihyung Woo, Sungwoo Lee, Kyung Park, Donggeun Jung, Hyoungsub Kim, Hoo-Jeong Lee,
    "Effects of surface treatments using PECVD-grown hexamethyldisiloxane on the performance of organic thin-film transistor",
    Thin Solid Films, 517, 4161 (2009)
     

  6. Sungwoo Lee, Jihyung Woo, Donggeun Jung, Jaeyoung Yang, Jin-hyo Boo, Hyoungsub Kim, Heeyeop Chae,
    "Effect of etching on dielectric constant and surface composition of SiCOH low-k films in inductively coupled fluorocarbon plasmas",
    Thin Solid Films, 517, 3942 (2009)
     

  7. Eunkyoung Nam, Hyungjun Park, Keunhee Park, Mi Ran Moon, Sunyoung Sohn, Donggeun Jung, Junsin Yi, Heeyeop Chae, Hyoungsub Kim,
    "Electroluminescence and impedance analyses of organic light emitting diodes using anhydride materials as cathode interfacial layers",
    Thin Solid Films, 517, 4131(2009)
     

  8. M. H. Jang, S. J. Park, D. H. Lim, M.-H. Cho, Y. K. Kim, H.-J. Yi, and H. S. Kim,
    "Structural stability and phase-change characteristics of Ge2Sb2Te5/SiO2 nano-multilayered films",
    Electrochem. Solid. St., 12, 4, H151(2009)
     

  9. K. Park, C.-H. An, M. S. Lee, C.-W. Yang, H.-J. Lee, and H. Kim,
    "Microstructural evolution and electrical characteristics of co-germanide contacts on Ge "
    J. Electrochem. Soc., 156, 4, H229 (2009)
     

  10. Myung Soo Lee, Chee-Hong An, Kyung Park, and Hyoungsub Kim,
    "Simultaneous control of the work function and interfacial oxide thickness using Ni/Hf stacked electrode on HfO2",
    Electrochem. Solid. St. Lett., 12, 4, H229 (2009)

2008

  1. J.-W. Lee, J.-H. Bae, M.-H. Park, H.-B. Kang, H. Kim, C-W. Yang,
    "Microstructural evolution of nickel-germanide in the Ni1-xTax/Ge systems during in situ annealing"
    J. Vac. Sci. Technol. A. 26, 4 (2008)
     

  2. Keunhee Park, Geumjoo Kim, Sunyoung Sohn, Donggeun Jung, Sungi Jang, Heeyeop Chae, Hyoungsub Kim, Junsin Yi, Min-Hye Kim, Young-Uk Kwon,
    "Efficiency enhancement and equivalent circuit analysis of polymer solar cells with a CF4-plasma-treated ITO anode surface"
    J. Korean. Phys. Soc. 53, 3 (2008)
     

  3. H. Shin, H. Kim, H. Lee, H. Yoo, J. Kim, H. Kim, M. Lee,
    "Photoresist-free lithographic patterning of solution-processed nanostructured metal thin films"
    Adv. Mater. 20, 18 (2008)
     

  4. C.-H. An, M. S. Lee, and H. Kim,
    "Effects of Si3N4 thickness on the electrical properties of oxide-nitride-oxide tunneling dielectrics"
    J. Electrochem. Soc. 155, 11 (2008)
     

  5. Changhyun Pang, Jinha Hwang, Keunhee Park, Donggeun Jung, Hyoungsub Kim, and Heeyeop Chae,
    "Efficiency enhancement of polymer solar cells by patterning nanoscale indium tin oxide layer"
    J. Nanosci. Nanotech. 8, 10 (2008)
     

  6. Y. -J. Cho, W. J. Lee, C. Y. Kim, M. -H. Cho, H. Kim, H. J. Lee, D. W. Moon, and H. J. Kang,
    "Band gap change and interfacial reaction in Hf-silicate film grown on Ge(001)"
    J. Chem. Phys. 129, 16 (2008)
     

  7. C. Y. Kim, S. W. Cho, M. -H. Cho, K. B. Chung, C. -H. An, H. Kim, H. J. Lee, and D. -H. Ko,
    "Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate"
    Appl. Phys. Lett. 93, 19 (2008)
     

  8. S. Sohn, J. Lee, K. Park, D. Jung, H. Kim, J. Yi,
    "Enhanced performance of an organic light-emitting device by using an oxidant component during a surface reaction process by using atomic layer chemical vapor deposition"
    J. Korean. Phys. Soc. 53, 6 (2008)
     

  9. H. Kim, S. Sohn, D. Jung, W. J. Maeng, H. Kim, T. S. Kim, J. Hahn, S. Lee, Y. Yi, M. -H. Ch,
    "Improvement of the contact resistance between ITO and pentacene using various metal-oxide interlayers"
    Org. Electron. 9, 6 (2008)
     

  10. B. -I. Hwang, K. Park, H. -S. Chun, C. -H. An, H. Kim, and H. -J. Lee,
    "The effects of the microstructure of ZnO films on the electrical performance of their thin film transistors"
    Appl. Phys. Lett. 93 (2008)

2007

  1. D. C. Kim, W. S. Han, H. K. Cho, B. H. Kong, and H. Kim,
    "Multidimensional ZnO light-emitting diode structures grown by metal organic chemical vapor deposition on p-Si"
    Appl. Phys. Lett. 91, 23 (2007)
     

  2. J. H. Lim, K. T. Kim, E. C. Park, J. Joo, H. Kim, H.-J. Lee, S.-B Jung and W. Nah,
    "Texture evolution in Ni substrate prepared by powder metallurgy and casting methods"
    Materials Science Forum, 534-536 (2007)
     

  3. C.-Y. Lee, J.-H. Lee, D.-H. Choi, H.-J. Lee, H. Kim, S.-B. Jung, and W.-C. Moon,
    "Effects of nodule treatment of rolled copper on the chemical properties of the flexible copper-clad laminate"
    Microelectron. Eng. 84, 11 (2007)
     

  4. J. Lee, C. Ryu, S. Lee, D. Jung, H. Kim, and H. Chae,
    "Carbon nanotube patterning with capillary micromolding of catalyst"
    Journal of Nanoscience and Nanotechnology, 7, 11 (2007)
     

  5. S. Jang, H. Chae, D. Jung, H. Kim, and C.-Koo. Kim,
    "Simultaneous oxygen plasma and thermal treatments of an ITO surface to improve the electrical characteristics of organic light-emitting diodes"
    J. Korean. Phys. Soc. 51, 3 (2007)
     

  6. D. Lee, D. Suh, Y. Pae, H. Kim, M.-H. Cho, and D.-H. Ko,
    "The dielectric characteristics and thermal stability of Hf-silicate films with different Si contents"
    J. Electrochem. Soc. 154, 8 (2007)
     

  7. D. Lee, D. Suh, D.-H. Ko, K. Park, M. S. Lee, and H. Kim,
    "Effects of annealing temperature on the electrical properties of ALD-grown Hf-Silicate films having various Si contents"
    J. Korean. Phys. Soc. 51, 1 (2007)
     

  8. K. Park, B. H. Lee, D. Lee, D.-H. Ko, K. H. Kwak, C.-W. Yang, and H. Kim,
    "A study on the thermal stabilities of the NiGe and Ni1-xTaxGe systems"
    J. Electrochem. Soc. 154, 7 (2007)
     

  9. S. H. Jang, J. H. Lim, K. M. Yoon, S. Y. Lee, K. T. Kim, E. C. Park, J. Joo, S.-B. Jung, and H. Kim,
    "The effects of the humidity and thickness on YBCO film prepared using the TFA-MOD method"
    IEEE Trans. Appl. Supercon. 17, 2 (2007)
     

  10. S. Sohn, K. Park, D. Jung, H. Kim, H. Chae, H. M. Kim, J. Yi, M.-H. Cho, and J.-H. Boo,
    "Characteristics of organic light emitting diodes with tetrakis(ethylmethyl amino) hafnium treated indium tin oxide"
    Jpn. J. Appl. Phys, 46, 19 (2007)
     

  11. J.-W. Lee, K.-H. Kwak, H. Kim, and C.-W. Yang, D. Lee, and D.-H. Ko,
    "In-situ annealing study on the thermal stability of nickel germanides"
    J. Korean Phys. Soc. 50, 3 (2007)
     

  12. S. G. Yoon, S. M. Kang, W. J. Park, H. Kim and D. H. Yoon,
    "Effects of process parameters on the refractive index of F-doped SiOC:H films grown by PECVD"
    Surface & Coating Technology. 201, 9 (2007)
     

  13. S. Lee, J. Yang, S. Yeo, J. Lee, D. Jung, J.-H. Boo, H. Kim, and H. Chae ,
    "Effect of annealing temperature on dielectric constant and bonding structure of low-k SiCOH thin films deposited by plasma enhanced chemical vapor deposition"
    Jpn. J. Appl. Phys, 46, 2 (2007)
     

  14. Y. W. Kim, Y. Roh, J.-B. Yoo, and H. Kim,
    "Characteristics of atomic layer deposition grown HfO2 films after exposure to plasma treatments"
    Thin Solid Films, 515, 5 (2007)

2006

  1. H. Kim and P. C. McIntyre,
    “Atomic layer deposition of ultrathin metal-oxide films for nano-scale device applications”
    J. Korean Phys. Soc. 48, 5 (2006)

     

  2. D. S. Kim, W. S. Yang , W. K. Kim, H. Y. Lee, H. Kim and D. H. Yoon,
    “DC-drift suppression of Ti:LiNbO3 waveguide chip by minimizing the contamination in oxide buffer layer”
    J. Crystal Growth 288, 188 (2006)

     

  3. J.H. Lim, S. H. Jang, J. Joo, H. Kim, H.-G. Lee, G.-W. Hong, and C.-J. Kim,
    “Fabrication of YBCO film approached by the '211 process' in the TFA-MOD method”
    Superconductor Science and Technology 19, 306 (2006)

     

  4. S. Lee, B. Koo, J. Shin, E. Lee, H. Park, and H. Kim,
    “Effects of hydroxyl groups in polymeric dielectrics on organic transistor performance”
    Appl. Phys. Lett. 88, 1621109 (2006)

     

  5. S. Sohn, K. Park, D. Lee, D. Jung, H. M. Kim, U. Manna, J. Lee, J.-H. Boo, H. Chae, and H. Kim,
    “Characteristics of polymer light emitting diodes with the LiF anode interfacial layer”
    Jpn. J. Appl. Phys 45, 3733 (2006)

2005

  1. R. Chen, H. Kim, P. C. McIntyre, and S. F. Bent,
    “Investigation of self-assembled monolayer resists for hafnium dioxide atomic layer deposition”
    Chem. Mater. 17, 536 (2005)
     

  2. K.-I. Seo, H. Kim, P. C. McIntyre, and K. C. Saraswat,
    “Formation of an interfacial Zr-silicate layer between ZrO2 and Si through in-situ vacuum annealing”
    Appl. Phys. Lett. 86, 082904 (2005)
     

  3. S. Sayan, N. V. Nguyen, J. Ehrstein, T. Emge, E. Garfunkel, M. Croft, X. Zhao, D. Vanderbilt, I. Levin, E. P. Gusev, H. Kim, and P. C. McIntyre,
    “Structural, electronic, dielectric properties of ultrathin zirconia films on silicon"
    Appl. Phys. Lett. 86, 152902 (2005)
     

  4. R. Chen, H. Kim, P. C. McIntyre, D. W. Porter, and S. F. Bent,
    “Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification”
    Appl. Phys. Lett. 86, 191910 (2005)
     

  5. Y.-E. Hong, Y.-S. Kim, K. Do, D. Lee, D.-H. Ko, J.-H. Ku, and H. Kim,
    “Thermal stability of Al- and Zr-doped HfO2 thin films grown by direct current magnetron sputtering”
    J. Vac. Sci. Tech. A 23, 1413 (2005)
     

  6. H. Kim, K. C. Saraswat, and P. C. McIntyre,
    “Comparative study on electrical and microstructural characteristics of ZrO2 and HfO2 grown by atomic layer deposition”
    J. Mat. Res. 20, 3125-3132 (2005)
     

  7. K. B. Chung, H. S. Chang, S. H. Lee, C. N. Whang, D.-H. Ko, H. Kim, D. W. Moon, and M.-H. Cho,
    “Hf-aluminate films with and without an interfacial layer during growth and postannealing”
    Electrochemical and Solid-State Letters 8, F51 (2005)
     

  8. M.-H. Cho, K.B. Chung, C. N. Whang, D.-H. Ko, and H. Kim,
    “Characteristics of HfO2-Al2O3 laminate films containing incorporated N as a fuction of stack structure and annealing temperature”
    Appl. Phys. Lett. 87, 262906 (2005)

2004

  1. H. Kim, P.C. McIntyre, and K. C. Saraswat,
    “Microstructural evolution of ZrO2-HfO2 nanolaminate structures grown by atomic layer deposition”
    J. Mat. Res. 19, 643 (2004)
     

  2. M.-H. Cho, H. S. Chang, D. W. Moon, S. K. Kang, B. K. Min, D.-H. Ko, H. Kim, P. C. McIntyre, J. H. Lee, J. H. Ku, and N. I. Lee,
    “Interfacial characteristics of HfO2 films grown on strained Si0.7Ge0.3 by atomic layer deposition”
    Appl. Phys. Lett. 84, 1171 (2004)
     

  3. H. Kim, A. Marshall, P. C. McIntyre, and K. C. Saraswat,
    “Crystallization kinetics and microstructure-dependent leakage current behavior of ultra-thin HfO2 dielectrics: in-situ annealing studies”
    Appl. Phys. Lett. 84, 2064 (2004)
     

  4. L. F. Schloss, H. Kim, and P. C. McIntyre,
    “Oxygen permeability of ferroelectric thin film top electrodes and its effect on detectable fatigue cycling-induced oxygen isotope motion”
    J. Mat. Res. 19, 1265 (2004)
     

  5. D.-H. Choi, H. Kim, and W. D. Nix,
    “Anelasticity and damping of thin aluminum films on silicon substrates”
    J. of Microelectromech. Syst. 13, 230 (2004)
     

  6. R. Chen, H. Kim, P. C. McIntyre, and S. F. Bent,
    “Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-k gate dielectrics”
    Appl. Phys. Lett. 84, 4017 (2004)
     

  7. C. O. Chui, H. Kim, K. C. Saraswat, and Paul C. McIntyre,
    “Atomic layer deposition of high-k dielectric for germanium MOS applications-substrate surface preparation”
    IEEE Electron Device Letters 25, 274 (2004)
     

  8. H. Kim, P. C. McIntyre, C. O. Chui, K. C. Saraswat, and S. Stemmer,
    “Engineering chemically-abrupt high-k metal oxide/silicon interfaces using oxygen-gettering metal overlayers”
    J. Appl. Phys. 96, 3467 (2004)
     

  9. H. Kim, P. C. McIntyre, C. O. Chui, K. C. Saraswat, and M.-H. Cho,
    “Interfacial characteristics of HfO2 grown on nitrided Ge (100) substrates by atomic-layer deposition”
    Appl. Phys. Lett. 85, 2902 (2004)

2003

  1. H. Kim, P. McIntyre, and K. C. Saraswat,
    “Effects of crystallization on the electrical properties of ultra-thin HfO2 dielectrics grown by atomic layer deposition”
    Appl. Phys. Lett. 82, 106 (2003)
     

  2. S.-Y. Lee, H. Kim, J.-S. Byun, P. C. McIntyre, and K. C. Saraswat,
    “Atomic layer deposition of ZrO2 on W for metal-insulator-metal capacitor application”
    Appl. Phys. Lett. 82, 2874 (2003)
     

  3. J. S. Byun, A. Mak, A, A. Zhang, A. Yoon, T. Zhang, A. Gelatos, R. Jackson, R. Thakur, S.-Y. Lee, and H. Kim,
    “Effect of NH3 thermal treatment on an atomic layer deposited on tungsten films and formation of W-B-N”
    J. Vac. Sci. Tech. B 21, 1466 (2003)
     

  4. D. Wang, Q. Wang, A. Javey, R. Tu, H. Dai, H. Kim, P. C. McIntyre, T. Krishnamohan, and K. C. Saraswat,
    “Germanium nanowire field-effect transistors with SiO2 and high-k HfO2 gate dielectrics”
    Appl. Phys. Lett. 83, 2432 (2003)
     

  5. H. Kim, C. O. Chui, K. C. Saraswat, and Paul C. McIntyre,
    “Local epitaxial growth of ZrO2 on Ge (100) substrates by atomic layer epitaxy”
    Appl. Phys. Lett. 83, 2647 (2003)

2002

  1. H. Kim and P. C. McIntyre,
    “Spinodal decomposition in amorphous metal-silicate thin films: phase diagram analysis and interface effects on kinetics”
    J. Appl. Phys. 92, 5094 (2002)
     

  2. A. Javey, H. Kim, M. Brink, Q. Wang, J. Guo, P. McIntyre, P. McEuen, M. Lundstrom and H. Dai,
    “High-k dielectrics for advanced carbon nanotube transistors and logic gates”
    Nature Materials 1, 241 (2002)

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